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An Experimental Study on Processing Parameters of Nanostructured Patterns in PMMA Thin Films by Scanning Probe Lithography

par Luiz Gustavo M. S. Barbosa et Ricardo M. Papaléo

Publié: 2 juillet 2025
Serveur de preprints: Preprints.org
DOI: 10.20944/preprints202507.0115.v1

In this work, reproducible routines were established for the processing of regular submi-cron-scale patterns in polymeric thin films using scanning probe lithography (one of the operating modes of a scanning probe microscope – SPM). Silicon probes were used to make the hole arrays in dynamic plowing mode. Afterwards, the tip was changed to view the arrays in intermittent contact mode. The routines were applied to PMMA thin films of different thicknesses, deposited by spin coating, optimizing this parameter for the for-mation of arrays in form of hole grid. The diameter and depth of the holes and also the height and width of the deformations to its outskirts were investigated as a function of the interaction force and the probe action time, as well of the thickness of polymer films.

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