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Differences in Residual Behavior of a Bumetrizole Type Ultraviolet Light Absorber during Formation of Various Microplastics

Publié
Serveur de preprints
Preprints.org
DOI
10.20944/preprints202312.2118.v1

Quality-changed behavior of ultraviolet light absorber (UVA: UV-326) in polymers (PP, HDPE, LDPE, PLA and PS) over time during degradation was studied with an enhanced degradation method (EDM) using sulfate ion radical in seawater. EDM was employed to homogeneously degrade the entire polymer samples containing the UVA. The PP and PS samples containing 5-phr UVA films whitened rapidly due to formation of numerous grooves or crushed particles. The UVA loss rate of PS with the higher Tg was much slower. The crystalline polymers, with the exception of PS, were similar in the behavior of the change in UVA loss rate with respect to degradation time. The significant increase in initial loss rate observed during EDM degradation was due to microplasticization. A similar increase in microplasticization rate occurred with the PS, but the intermolecular interaction between UVA and PS did not result in as pronounced its increase in loss rate as with other polymers. The UVA chemical structure was not altered by EDM degradation. These results revealed that the UVA leaching from the polymer matrix was the primary cause of the loss.

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